From Sand to Superintelligence · Drill cards · Chapter 08
Drills
Light at 13.5 Nanometers
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| Front | Back |
|---|---|
| What is the wavelength of EUV light used in semiconductor lithography? | 13.5 nanometers. |
| Which company is the sole manufacturer of EUV scanners? | ASML, based in Veldhoven, the Netherlands. |
| How much does a single EUV scanner cost? | Roughly $200 million. |
| How heavy is an EUV scanner? | On the order of 150 metric tons. |
| How many EUV scanners are in use across the entire planet? | Perhaps 200. |
| How many tin droplets are vaporized per second to produce EUV light? | 50,000 per second. |
| What temperature does the tin plasma reach? | Over 200,000°C. |
| What type of laser fires the two pulses that create the EUV plasma? | A CO₂ laser — a pre-pulse to flatten the droplet, then a main pulse to vaporize it. |
| How many alternating bilayers make up an EUV mirror, and of what materials? | About 50 alternating bilayers of molybdenum and silicon. |
| By what factor does the EUV scanner demagnify the mask image onto the wafer? | 4× — the projected image is one-quarter the size of the mask. |